SMEE displays next-gen dry lithography scanner at CIIE
Briefing by News4U · First published
From November 5 to 10, SMEE presented its SSC800 and SSB800 dry lithography scanners at the ninth China International Import Expo in Shanghai, displaying domestic front-end lithography progress. The company, founded in 2002, is the only domestic manufacturer capable of stable volume delivery of front-end dry scanners. Imaging performance now matches leading international peers, overlay accuracy and throughput are closing the gap, and multiple units have cumulatively processed over ten million wafers with uptime above 92 percent. [1] [2]
Sources
- 快讯
Wall Street CN · · Full text
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